LED MOCVD Precursors
Metal-organic chemical vapor deposition (MOCVD) is the method of choice for depositing In- and Ga-containing layers in compound semiconductor applications. While MOCVD has a long history of creating GaAs-based devices, in recent years, light-emitting diodes (LEDs) have grown rapidly in importance. In LEDs, the choice of material depends on the wavelength desired, and most semiconductor materials contain Ga or In, and other elements (for example red LEDs contain AlGaAs, green LEDs contain AlGaInP, blue LEDs contain InGaN).
The precursor materials used for In and Ga are tri-methyls of In or Ga, i.e., TMI (tri-methyl-indium) and TMG (tri-methyl-gallium). The starting materials for manufacturing these high-purity metal-organic precursor materials are indium trichloride and gallium trichloride, respectively.
Indium Corporation manufactures both indium trichloride and gallium trichloride for these markets.
LED MOCVD Precursors Technical Documents
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Indium Corporation Blog Posts
Visit Indium Corporation at APEX 2018 in San Diego, CA February 27th through March 1st.
Dr. Robert Ploessl, Manager of Marketing and Technology Assessment and Product Manager, Compounds, gives Phil Zarrow an overview of what Cpk and Cpu mean in relation to calculating the purity of Indium Corporation compounds and how it differs from calculating Cpk and Cpu in assembly processes.
Kim Flanagan, Technical Support Engineer, and Phil Zarrow discuss how to Avoid the Void® by looking at four non-QFN void types—Kirkendall (champagne), shrinkage, via-in-pad, and blowhole—and how to decide if voiding is a defect or a symptom.
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