LED MOCVD Precursors
Metal-organic chemical vapor deposition (MOCVD) is the method of choice for depositing In- and Ga-containing layers in compound semiconductor applications. While MOCVD has a long history of creating GaAs-based devices, in recent years, light-emitting diodes (LEDs) have grown rapidly in importance. In LEDs, the choice of material depends on the wavelength desired, and most semiconductor materials contain Ga or In, and other elements (for example red LEDs contain AlGaAs, green LEDs contain AlGaInP, blue LEDs contain InGaN).
The precursor materials used for In and Ga are tri-methyls of In or Ga, i.e., TMI (tri-methyl-indium) and TMG (tri-methyl-gallium). The starting materials for manufacturing these high-purity metal-organic precursor materials are indium trichloride and gallium trichloride, respectively.
Indium Corporation manufactures both indium trichloride and gallium trichloride for these markets.
LED MOCVD Precursors Technical Documents
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Indium Corporation Blog Posts
Non-Wet Opens (NWO): Understand the cause as well as the necessary flux technology to mitigate them.
High performance thermal management requires high performance materials. In this case, Heat-Spring®
An NWO is a defect where the paste goes with the ball on a BGA and does not wet to the board pad.
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