The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
Related Markets and Applications
Gallium Alloy Blog Posts
Today I was sent an article that involves TWO of my favorite elements, indium and gallium which, when combined with tin, creates an alloy that is used in the process of water purification.
Gallium has a melting point of ~30°C (86°F), which makes the physical state of the metal as predictable as the shipping temperatures it endures as it travels to you.
Today we discuss the technology behind the paper: “Extreme Toughening of Soft Materials with Liquid Metal” with Dr. Navid Kazem.
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