The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
Related Markets and Applications
Gallium Alloy Blog Posts
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Jim Hisert discusses the composite material that is electrically insulating until it is patterned, at which point it becomes conductive.
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