The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
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Gallium Alloy Blog Posts
Dave Letterman, of late night talk show host fame, has made the Top Ten List a popular vehicle for comedy, but it is also often used to convey useful information in an easy to read format. I have read a lot of these lists in my time, and it is always fun to see one that talks about a topic near…
One of the most common misconceptions about CIG powder is that it is made up of individual copper particles, indium particles, and gallium particles. Indium Corporation's CIG powder is actually alloyed BEFORE it is made into powder, ensuring that each particle is the proper ratio of copper, indium,…
A visitor at our booth during the 2013 SVC (Society of Vacuum Coaters) conference suggested this video. In the video, a piece of indium is rubbed against a piece of gallium. The result is the formation of a room temperature alloy (75.5%Ga/24.5%In, mp: 15.7°C). One of the fun parts of my job is…
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