The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
Related Markets and Applications
Gallium Alloy Blog Posts
Stretchable circuits can change the way we think about electronics applications.
High-purity Gallium III Trichloride, GaCl3, particularly EZ-Pour®, is particularly efficacious in electronics due to its ease of use and high surface area.
When the lighting market is fully penetrated by LEDs, there will likely be more GaN wafers produced than silicon wafers.
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