The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
Related Markets and Applications
Gallium Alloy Blog Posts
Today we discuss the technology behind the paper: “Extreme Toughening of Soft Materials with Liquid Metal” with Dr. Navid Kazem.
What does the future bring for self-healing circuits? Electrical self-healing is important, but what about mechanial self-healing?
What are some real-world applications for stretchable electronics made of gallium and indium - both near-term and long-term?
Indium Corporation does not recommend, manufacture, market, or endorse any of our products for human consumption.
From One Engineer to Another®
All of Indium Corporation’s products and solutions are designed to be commercially available
unless specifically stated otherwise.