The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
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Gallium Alloy Blog Posts
The LED lighting revolution has arrived.
This video discusses a unique metal: gallium. It discusses various physical (thermal, electrical) properties and applications of gallium and gallium alloys, including: solder alloying, liquid metal alloying, and wetting to glass.
If you haven’t heard about Bi-containing (bismuth) solder alloys recently, that may change in the near future. Low-melting Bi-containing solders are now in increasing use and gaining popularity due to their lower melting temperatures—58Bi/42Sn is eutectic at 138°C and 57Bi/42Sn/1Ag melts 137-139°C (both are Pb-free alternatives). A low-temperature solder is advantageous...
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From One Engineer to Another®
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