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Sputtering Target Bonding

Home » Applications » Thin-Film » Sputtering Target Bonding

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Sputtering Target Bonding
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Watch the Sputtering Target Bonding Video

NanoFoil® and NanoBond® simplify the sputtering target bonding process, allowing target bonders and target manufacturers to make reliable and repeatable bonds while increasing margins and lowering capital expenditures.

Sputtering Target Bonding

Sputtering Target Bonding

Features of NanoFoil® in Target Bonding:

Sputtering Target Bonding
C-Scan; Less than 2% voiding
  • Room temperature bonding
  • Uniquely well-suited to bonding materials with dissimilar CTEs
  • Lowers overall cost of solder bonding process: materials, capital expenditures, and personnel
  • Uniform bondline thickness
  • Compatible with any solder
  • Minimized stress from CTE mismatch
  • Adopted for bonding applications requiring the higher precision demanded by the semiconductor industry
  • Minimal voiding – up to 99% coverage
  • Lowers overall cost of materials, capital expenditures, and personnel
  • Any size target can be NanoBonded

Globally, target manufacturers, bond shops, and end users have realized the potential of NanoBonded sputtering targets.

NanoFoil® significantly improves existing planar target bonding methods through the use of localized heat. When activated, NanoFoil® delivers localized heat that bonds similar or dissimilar materials in just a fraction of a second, in any environment, therefore eliminating the need for a standard furnace, torch, or laser. The rapid and versatile nature of this novel bonding method offers process cost reductions over traditional bonding methods.

Ceramic Sputtering Target

NanoBonding results in Flat & Parallel Assemblies

Furnace Soldering Furnace Soldering
Maximum Y Deflection: 0.68 mm
NanoBonding NanoBonding
Maximum Y Deflection: 0.038 mm
Color Meter

Residual stresses and deflections from NanoBonded targets are an order of magnitude less than conventional bonding [Von Mises Stress (MPa)].

NanoBond® produces a strong, flat, low stress bond that is highly thermally and electrically conductive. NanoFoil® works by acting as a local heat source to melt adjacent solder layers without heating the target or backing plate materials. This allows the bonding of nearly any combination of sputtering target material and backing plate material, including ceramics to metals, irrespective of the difference in coefficient of thermal expansion (CTE). This process, called NanoBond®, requires no expensive equipment and can be integrated into any process.

NanoBond® Services:

Indium Corporation offers NanoBonding services in our target bond shop located in Utica, NY. Let our team of trained, professional target bonders NanoBond® your targets. We routinely bond targets for the solar and semiconductor industry.

  • Generation 10

Top Sputtering Target Bonding Technical Documents

  • Eliminating Bond Stress of Sputtering Targets at Operational Temperatures (Paper)

    Technical Paper

  • High Temperature, Pb-Free, Metallic Sputtering Target Bonding Using Reactive Multilayer Foil (Paper)

    Technical Paper

Sputtering Target Bonding Technical Documents

Whitepapers

Request This Document

Eliminating Bond Stress of Sputtering Targets at Operational Temperatures

Authors: Jim Hisert, Jon Major

Posted on 3 May 2013

Request This Document

High Temperature, Pb-Free, Metallic Sputtering Target Bonding Using Reactive Multilayer Foil

Authors: Jacques Matteau, Jim Hisert, Jon Major, Ronnie Spraker

Posted on 25 Apr 2013

Request This Document

Low-Melting Metallic Sputtering Targets Bonded At Room Temperature (Ambient)

Authors: Jim Hisert, Thomas Acchione

Posted on 21 Jan 2011

Request This Document

Stress-Free Bonding of Large Linear Sputtering Targets for LCD Displays

Authors: A. Duckham, D.B. Deger, D.M. Lunking, E.L. Walters, H.B. Parker, J.E. Newson, M.A. Curran, N.G. Piegari, T.J. Acchione

Posted on 10 Mar 2010

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Application Notes

NanoFoil® User Guide (A4)
NanoBond® of Ceramic and Metal Sputtering Targets (Letter) (A4)
Bonding Sputtering Targets with NanoFoil® (Letter)
NanoBond®: The Process for Using NanoFoil (Letter)
Large Area Bonding Using NanoFoil® (Letter)

Product Data Sheets

NanoFoil® for High-Temperature Applications (Letter) (A4)
NF40 NanoFoil® for Bonding Electronics Assembly A4 (A4)
WMA-SMQ69HT High Temperature Water Soluble Solder Paste (Letter)

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Material Safety Data Sheets

NanoFoil®

Sputtering Target Blog Posts

The Perfect Sputtering Target Bond

Thursday, May 23, 2013 by Jim Hisert [view bio]

Why do we care so much about target bonding? This is important because a sputtering target that truly performs will allow greater process flexibility, and higher throughput. An introduction from Eliminating Bond Stresses of Sputtering Targets at Operating Temperatures: “…It was observed…

Bonded Sputtering Targets are a Bi-Metallic Assembly

Tuesday, May 21, 2013 by Jim Hisert [view bio]

Whenever two materials with different coefficient of thermal expansion values are bonded together, they will expand and contract as the temperature changes. Assuming these two materials are bonded rigidly, there are two things that can happen as the temperature changes: 1) the bond will break apart…

High Temperature (Braze Alloy) Sputtering Target Bonding, with NanoFoil®

Tuesday, May 14, 2013 by Jim Hisert [view bio]

In an earlier post I mentioned one of the presentations we gave at the 2013 SVC TechCon. The other presentation that our team delivered at the show (presented by Jacques Mateau) regarded another very interesting topic. The paper, High Temperature, Pb-Free, Metallic Sputtering Target Bonding…

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Seth Homer

This page is owned by:

Seth Homer
Assistant Product Manager
shomer@indium.com

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