The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
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Gallium Alloy Blog Posts
Here are three interesting things that I'm predicting will happen with indium in 2019.
In one important way, gallium is fundamental to modern living: lighting. The semiconducting properties of gallium nitride make it an attractive material for LED devices.
A new paper sparked my interest recently: Experimental Thermal Energy Assessment of a Liquid Metal Eutectic in a Microchannel Heat Exchanger Equipped With a (10Hz/50Hz) Resonator which talks about alternatives to liquid metal for high-temp heat exchange applications. Unfortunately, they left out my favorite alloy - eutectic gallium-indium or EGaInTM.
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