The gallium compounds we offer include gallium trichloride (GaCl3) and gallium oxide (Ga2O3).
Gallium is a crucial material for building compound semiconductor devices. To form epitaxial GaN layers chemical vapor deposition (CVD) techniques are typically used, and the CVD gallium precursor (trimethyl-gallium) is typically made from high purity gallium trichloride.
Gallium oxide is needed for sputtering targets that consist of indium, gallium, and zinc oxides. The IGZO or GIZO sputtering targets are used in next generation displays, where high currents and pixel densities make it necessary to use ever higher performing materials. The GIZO material offers the right properties to deposit high mobility active channels for the thin film transistors in the display’s active matrix backplane.
Related Markets and Applications
Gallium Alloy Blog Posts
A new paper sparked my interest recently: Experimental Thermal Energy Assessment of a Liquid Metal Eutectic in a Microchannel Heat Exchanger Equipped With a (10Hz/50Hz) Resonator which talks about alternatives to liquid metal for high-temp heat exchange applications. Unfortunately, they left out my favorite alloy - eutectic gallium-indium or EGaInTM.
Indium Corporation manufactures 60 different alloys that contain indium, in addition to over 150 other non-indium-bearing alloys, such as SAC and SnPb.
Today I was sent an article that involves TWO of my favorite elements, indium and gallium which, when combined with tin, creates an alloy that is used in the process of water purification.
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From One Engineer to Another®
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