Compostos de gálio
Óxido de gálio
Gallium oxide (Ga₂O₃), also known as gallium (III) oxide or gallium sesquioxide, is an advanced wide-bandgap semiconductor material recognized for its potential to improve power electronics, optoelectronics, and high-frequency devices. A reliable, high-quality supply of this semiconductor is crucial, and with years of expertise in gallium, Indium Corporation is the preferred choice for customers seeking premium product quality and service.
Desenvolvido por Indium Corporation
- Superior Purity and Quality
- High Volume and Reliable Supply
- Décadas de experiência
Caraterísticas
4.8 eV
Ga2O3 is gaining attention as an ultra-wide bandgap (~ 4.8 eV) semiconductor in power electronics.
74.39%
74.39% is the theoretical gallium percentage in gallium oxide.
B-phase
Gallium oxide’s β-phase is the most stable and commonly used form, which is why it’s the primary structure in most commercial applications.
Gallium Oxide Products
Our gallium (III) oxide is a high-purity white powder primarily in the β-phase, confirmed by X-ray diffraction (XRD). This compound has a purity grade of 99.99% (4N) and is available in a variety of particle size distributions, catering to specific industry needs. It’s also packaged in PE bottles, plastic pails, or drums, depending on quantity requirements.
| Imóveis | Tetracloreto de germânio |
|---|---|
| Appearance | White powder |
| Ponto de fusão | 1900°C |
| Density (Material) | 6.44 g/cm³ |
| Density (Apparent) | 0.7 g/cm³ |
| Solubilidade | Solúvel em álcalis fortes e ácidos quentes; insolúvel em água |
| Theoretical Gallium Content | 74.39% |
Aplicações relacionadas
Gallium Oxide is suitable for the below applications.
Síntese química
Indium and gallium compounds for chemical synthesis…
Mercados relacionados
Gallium oxide plays a significant role in the semiconductor market, particularly in the production of Ga₂O₃ wafers through methods like edge-fed film growth (EFG) and czochralski (CZ). It is also crucial for manufacturing sputtering targets such as IGZO or GIZO, which are essential for next-gen displays requiring high currents and pixel densities. GIZO, with its superior properties, enables the deposition of high-mobility active channels in thin-film transistors on the display’s active-matrix backplane.
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High-purity compound for advanced technologies.
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