Products Fluxes Wafer Bumping Flux

Wafer Bumping Flux

Indium Corporation creates and provides top-tier wafer bumping (bump fusion) fluxes designed to eliminate oxides and other contaminants during reflow and cleaning. Our fluxes can be applied to solder-bumped and copper-pillar/solder-capped wafers through dispensing or spin coating techniques.

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  • Water-Washable or Solvent-Cleanable
  • Suitable for Use with Various Alloys
  • Widely Compatible
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Indium Corporation boasts a longstanding reputation for delivering high-quality wafer-bumping fluxes. Our extensive portfolio features materials tailored for various applications, including traditional wafer bumping processes where fluxes are spin-coated onto plated bumps or copper pillars. Additionally, our products excel in printing applications, where flux is applied to wafers before a ball drop process, commonly used in wafer-level CSP (WLCSP), as well as wafer-level and panel-level fan-out packages.

Our wafer-bumping flux products are compatible with polymers and passivation materials commonly used in wafer processing and packaging assembly.

  • Applied by jetting or dispense, followed by spin coating to optimize film thickness
  • Reflow in inert atmosphere (typically <20ppm O2 level)
  • Converts rough, non-spherical, plated, or wafer probe-dented solder bumps into shiny oxide-free bumps
  • Proven applications include copper-pillar microbumps and standard solder bumps
  • Applied by printing onto wafer or panel using screen or stencil, followed by a ball drop process
  • Wafer bumping flux WS-3401 is used in most advanced 2.5D chip on wafer packaging technology.
  • Wafer bumping flux SC-5R has been used for over 10 years in legacy products.

Wafer bumping with flux continues to be a widely used method, although some have transitioned to flux-less equipment and processes. Flux is highly effective in producing uniformly low-oxide and well-rounded bumps with optimal morphology.

Flux Type*Flux Application MethodDescriptionCleaning MethodHalogen-FreeMaterial
SCDispence/Spin CoatingHigh-Pb, SnPb-eutectic, and SnAg solder bumpsSolvent- or aqueous-based chemistryYesSC-5R
WSDispence/Spin Coating20-65 micron pitch copper-pillars with SnAg or Sn100 microbumpsWarm DI waterYesWS-3401
WS-3543
Flux Type*Flux Application MethodDescriptionCleaning MethodHalogen-FreeMaterial
WSPrinting0.5mm and smaller pitch wafer-level or panel-level package; also suitable for LED die-attach applicationWarm DI waterYesWS-676
WS-759
WS-829
ConsiderationsSolder Paste
Printing
PlatingFlux/Solder
Ball Printing
C4-NP
(Suess/IBM)
Used In High Volume Manufacturing?YesYesYesYes
Alloy RestrictionsAll solder alloys, as long as powder can be madeBinary alloys only (Sn/Pb, Sn/Ag, Sn/Cu etc.) due to alloy control issuesAll solder alloys, as long as sphere can be madeProbably limited to binary alloys
Bump SizeDown to around 125micron pitch only. Only 45% of paste volume is metalDown to 2micron bumps feasible: possibly less60micron bump diameter in mass production, but most commonly used for wafer level CSP manufacturingUnknown
Bump UniformityOK: can vary significantly with age of solder paste and print process variablesGoodGood with appropriate tight tolerance solderspheresGood
VoidingCommonLittle or no with a controlled plating processLittle or noLittle or no
Cost ComparisonLow CostMore ExpensiveLow CostHigh Capital Cost
PrototypingFairly EasyComplexEasyComplex

Product Data Sheets

WS-3518 Wafer Flux PDS 98431 (A4) R3.pdf
WS-3518 Wafer Flux PDS 98431 R3.pdf
WS-3543 Wafer Flux PDS 98398 (A4) R3.pdf
WS-3401-A Wafer Flux PDS 98764 R4.pdf

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