Indium Blog

Magnetron Design Affects Arcing and Transfer Efficiency

  • Indium Corporation
  • Sputtering Target

  • This picture (shared by Angstrom Sciences) shows a planar target plate that has developed an advanced case of nodule formation. Nodules occur when material is re-deposited back onto the sputtering target. This is normal for most sputtering targets – although nodules increase the occurrence of arcing by building up charge on the target surface.

    Equipment suppliers can suppress nodule formation (and arcing) by offering:

    • high yield magnetrons
    • full-face erosion magnetrons
    • rotary magnetrons

    The transfer efficiency of planar targets is based on magnetron design. High yield and full-face erosion magnetrons sweep the sputtering tool’s magnets over more of the sputtering target's surface – so the racetrack is more uniform. The next step is to move to rotary magnetrons for a decrease in arcing and huge increase in target utilization!

    Feel free to contact me to discuss this in detail.

    Jim Hisert

    Authored by previous Indium Application Manager Jim Hisert