The difference between rotary and planar sputtering targets has been discussed before, but here we will be focusing on the reclaim/recycling aspect of both rotary and planar indium-containing sputtering targets. As a quick refresher:
- Rotary targets are well-suited for continuous sputtering processes. Continuous processing increases throughput since there is less time wasted preparing the sputtering chamber
- Rotary targets are more cost effective for high volume processes. They provide a good platform for long runtime processes, with less chance of defects and downtime
- Planar targets are still best suited for prototype work or elemental experimentation, especially when large amounts of material are not needed at once
Let’s now look at how the reclaim process works for our customers:
In general, the process for our customers is the same for rotary or planar targets. A sample of the material is sent in and analyzed. The next step is an evaluation/quote for the material. If everything looks good, the spent targets are then sent to Indium Corporation and the customer is paid for the material. Alternately, the price of the reclaim can be used towards new indium or a new target.
As far as the material re-use is concerned, there will usually be more indium-contained material left on a planar target – simply due to the inherent lack of efficiency compared to rotary magnetron technology. To replace a planar target, I would suggest a NanoBond® target. For rotary targets, indium material can be directly manufactured onto the backing tube in a “hybrid consolidation” process. Both technologies offer the lowest bonding void levels available.
For inquiries regarding reclaim, please contact us at: email@example.com
If you are interested in discussing sputtering targets, contact our team at: Solar@Indium.com.